Kompakte gütegeschaltete DPSS-Laser der NL200-Serie

The model choice is mainly a balance between pulse energy and maximum repetition rate. NL201 reaches 2500 Hz and provides 0.9 mJ at 1064 nm, making it suitable when pulse frequency takes priority over energy per pulse. NL202 increases the 1064 nm pulse energy to 2.0 mJ at up to 1000 Hz, while NL204 provides 4.0 mJ at the same maximum rate. The harmonic outputs follow the same progression; at 532 nm, for example, the models provide 0.3, 0.9 and 2.0 mJ respectively. Selection should therefore be based on the required energy at the actual working wavelength, together with the process throughput and trigger rate needed by the wider system.

The series can operate at 1064 nm and can be equipped for 532, 355, 266 or 213 nm output. Pulse energy decreases as the harmonic order rises: across the three models, the specified ranges are 0.3–2.0 mJ at 532 nm, 0.2–1.3 mJ at 355 nm, 0.08–0.6 mJ at 266 nm and 0.04–0.2 mJ at 213 nm. This matters when shorter wavelengths are selected for material absorption, spectroscopy or ablation, because the available pulse energy must still meet the application threshold. If 1064 nm output is also required with a harmonic option, that requirement should be defined when ordering because the fundamental output may be optimised for harmonic conversion and differ from the tabulated value. The final wavelength choice should therefore be based on both the optical interaction and the available energy budget, rather than wavelength alone.

The beam is specified as close to Gaussian in both near and far fields, with M² below 1.3. At 1064 nm, roundness is 0.9–1.1, the typical beam diameter is 0.7 mm at the 1/e² level, and full-angle divergence is below 3 mrad. Beam pointing stability is ≤10 µrad RMS, which helps limit movement of the focused spot during repeated operation. These characteristics support controlled focusing for micromachining, display repair and other processes where spot shape and position influence the result. The focusing optic, working distance and selected harmonic wavelength must still be considered in the complete optical design, as the tabulated beam diameter and divergence are specified at 1064 nm.

Short-term pulse energy stability is specified by wavelength, while long-term behaviour is represented by the power-drift figure. The standard deviation is below 0.5% at 1064 nm, below 2.5% at 532 nm, below 3.5% at 355 nm, below 4% at 266 nm and below 5% at 213 nm. These figures are averaged from pulses emitted over a 30-second interval. Power drift is ±2% over eight hours after a 20-minute warm-up, provided ambient temperature varies by less than ±2 °C and humidity by less than ±5%. Process qualification should separate pulse-to-pulse variation from longer-term drift and reproduce the stated warm-up and environmental conditions.

The NL200 Series supports external TTL triggering and remote operation through a keypad or digital control interfaces. Available connections include USB, RS232, LAN and WLAN, while REST API commands allow control from a host running different operating systems. Optical jitter is specified below 0.5 ns standard deviation relative to the QSW IN or SYNC OUT pulse, providing a defined timing parameter for synchronised experiments and automated equipment. This allows the laser to be coordinated with motion stages, acquisition systems or process controllers, provided the overall timing budget also includes delays elsewhere in the system. Interface selection can therefore follow the host controller, cable layout and facility network rather than requiring one fixed control method.

Installation requires space for a separate laser head and power supply, together with suitable ventilation and environmental control. The basic head measures 164 × 320 × 93 mm without an optional harmonic module, the power supply measures 470 × 390 × 140 mm, and the umbilical is 3 m long. The system is air cooled, operates from 100–240 V AC single phase at 50/60 Hz and consumes less than 600 W. The specified environment is 18–30 °C, 20–80% relative humidity without condensation, and room cleanliness no worse than ISO Class 9. The mains supply should remain connected continuously; after an interruption longer than one hour, a warm-up of several hours is required before switching on. These constraints should be included in the bench layout, enclosure design and facility power planning.

The range covers industrial processing and scientific use where short nanosecond pulses, variable repetition rate and selectable wavelengths are required. Listed processing applications include marking, micromachining, engraving, thin-film removal, laser cleaning, deposition, ablation and LCD or OLED panel repair. Scientific applications include spectroscopy, OPO pumping, remote sensing, photoacoustic imaging and LIBS-related material analysis. The sub-10 ns pulse duration, M² below 1.3 and external triggering can support controlled focusing and synchronisation, but suitability still depends on the material, optical arrangement and required pulse energy. A practical selection process should start with the target wavelength and pulse-energy threshold, then confirm the repetition rate, beam delivery and environmental requirements.