Thin Film Reflectometry System, NanoCalc

Ocean Optics NanoCalc Thin Film Reflectometry System

Manufacturer's part number :

NanoCalc Thin Film Reflectometry System

Manufacturer Ocean Optics

Ocean Optics

Description :

The NanoCalc Thin Film Reflectometry System allows you to analyze the thickness of optical layers from 1 nm to 250 µm.. You can observe a single thickness with a resolution of 0.1 nm. Depending on your software choice, you can analyze

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    Features

  • Analyze single- or multi-layer films
  • Resolution to 0.1 nm
  • Ideal for in situ, on-line thickness measurements
  • Convenient options for a variety of applications
  • Benefits

  • NanoCalc Thin Film Reflectometry Systems are ideal for in situ, on-line thickness measurements and removal rate applications.
  • Can be used to measure the thickness of oxides, SiNx, photoresist and other semiconductor process films.
  • NanoCalc Systems measure anti-reflection coatings, anti-scratch coatings and rough layers on substrates such as steel, aluminum, brass, copper, ceramics and plastics.
Model NANOCALC-VIS NANOCALC-XR NANOCALC-DUV NANOCALC-NIR
Wavelength range: 400-850 nm 250-1050 nm 190-1100 nm 900-1700 nm
Thickness range: 50 nm - 20 µm 10 nm - 100 µm 1 nm - 100 µm 100 nm - 250 µm
Optical resolution: 0.1 nm 0.1 nm 0.1 nm 0.1 nm
Repeatability: 0.3 nm 0.3 nm 0.3 nm 1.0 nm
Angle of incidence: 90º 90º 90º 90º
Number of layers: Up to 10 Up to 10 Up to 10 Up to 10
Refractive index: Yes Yes    
Measurement speed: 100 ms to 1 s 100 ms to 1 s 100 ms to 1 s 100 ms to 1 s
Test materials: Transparent or semi-transparent thin film materials